Lithographic characterization of improved projection optics in the EUVL engineering test stand

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 83-94

  O'Connell, Donna J ^a   Lee, Sang H ^b   Ballard, William P ^a   Tichenor, Daniel A ^a   Bernardez II, Luis J ^a   Haney, Steven J ^a   Johnson, Terry A ^a   Barr, Pamela K ^a   Leung, Alvin H ^a   Jefferson, Karen L ^a   Replogle, William C ^a   Goldsmith, John E M ^a   Chapman, Henry N ^c   Naulleau, Patrick ^d   Wurm, Stefan ^e   Panning, Eric ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b INTEL CORPORATION   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^e INFINEON TECHNOLOGIES   (United States)

Author keywords

Aerial image contrast; EUVL; Extreme ultraviolet; Flare; Laser produced plasma; Lithography; Projection optics box

Indexed keywords

CHARACTERIZATION; DIFFRACTIVE OPTICS; ERRORS; IMAGE QUALITY; LASER PRODUCED PLASMAS; MATHEMATICAL MODELS; NUMERICAL METHODS; OPTICAL DESIGN; ULTRAVIOLET RADIATION;

AERIAL IMAGE CONTRAST; AERIAL IMAGE CONTRAST MEASUREMENT; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET HIGH VOLUME MANUFACTURING TOOLS; NUMERICAL APERTURE; PROJECTION OPTIC BOX;

LITHOGRAPHY;

EID: 0141724844     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484967     Document Type: Conference Paper

References (17)

1. D. A. Tichenor, et al., "System Integration and Performance of the EUV Engineering Test Stand," Emerging Lithographic Technologies V, Proc. of SPIE vol. 4343, 19-37 (2001).
2. W. P. Ballard, et al., "High-Power Laser-Produced-Plasma EUV Source," Emerging Lithographic Technologies VI, Proc. of SPIE vol. 4688, 302-309, (2002).
3. L. E. Klebanoff, et al., "First Environmental Data from the EUV Engineering Test Stand," Emerging Lithographic Technologies V, Proc. of SPIE Vol. 4343, 342-346, (2001).
4. L. E. Klebanoff, et al., "Environment Data from the EUV Engineering Test Stand (ETS)," Emerging Lithographic Technologies VI, Proc. of SPIE vol. 4688, 310-315, (2002).
5. L. E. Klebanoff, et al., "Rates and mechanisms of optic contamination in the EUVL engineering test stand," These proceedings, (2003).
6. W.P. Ballard, et al., "System and Process Learning in a full-field, high power EUVL alpha tool," Emerging Lithographic Technologies VII, Proc. of SPIE vol. 5037, submitted (2003).
7. H. N. Chapman, et al., "First lithographic results from the EUV engineering test stand," J. Vac. Sci. Technol. B, vol. 19 2389-2395 (2001).
8. D. A. Tichenor, et al., "Performance upgrades in the EUV Engineering Test Stand," Emerging Lithographic Technologies VI, Proc. of SPIE vol. 4688, 72-86, (2002).
9. S. Lee, et al., "Lithographic evaluation of the EUV engineering test stand," Emerging Lithographic Technologies VI, Proc. of SPIE vol. 4688, (2002).
10. K. A. Goldberg, et al., "Honing the accuracy of extreme ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic," Emerging Lithographic Technologies VI, Proc. of SPIE vol. 4688, 329-337, (2002).
11. P. Naulleau, et al., "At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic," J. Vac. Sci. Technol. B vol. 19, 2396-2400 (2001).
12. P. Naulleau et al., "Static microfield printing at the Advanced Light Source with the ETS Set-2 optic," Emerging Lithographic Technologies VI, Proc. of SPIE 4688, 64-71, (2002).
13. P. Naulleau, et al., "Static EUV microexposures using the ETS set-2 optics," Emerging Lithographic Technologies VII, Proc. of SPIE vol. 5037, submitted (2003).
14. H.N. Chapman, and D.W. Sweeney, "A rigorous method for compensation selection and alignment of microlithographic optical systems," Proc. SPIE Vol. 3331, 102-113 (1998).
15. E. M. Gulikson, et al., "EUV scattering and flare of 10x projection cameras," International Sematech workshop on EUV Lithography, October 29, 2001, Matsue, Japan.
16. C. Krautschik, et al., "Implementing flare compensation for EUV masks through localized mask CD resizing," Emerging Lithographic Technologies VII, Proc. of SPIE vol. 5037, submitted (2003).
17. S. H. Lee, et al., "Lithographic flare measurements of EUV full-field projection optics," Proc. of SPIE vol. 5037, submitted (2003).