Feasibility study of EUV scanners

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 60-69

  Ota, K ^a   Murakami, K ^a   Kondo, H ^a   Oshino, T ^a   Sugisaki, K ^a   Komatsuda, H ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MIRRORS; OPTICAL DESIGN; OPTICAL RESOLVING POWER; PROJECTION SYSTEMS; SCANNING; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) SCANNERS; WAFER ALIGNMENT SENSORS; WAFER FOCUS SENSORS;

PHOTOLITHOGRAPHY;

EID: 0034758229     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436704     Document Type: Conference Paper

References (8)

1. Novel illumination for EUVL
2. High-Efficiency condenser design for illuminating a ring field
3. Thermally induced structural modification of Mo-Si multilayers
4. Asymmetric properties of the aerial image in extreme ultraviolet lithography
5. Asymmetric properties of the aerial image in extreme ultraviolet lithography
6. New alignment sensors for wafer stepper