MAPPER: High Throughput Maskless Lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7470, Issue , 2009, Pages

  Kuiper, V ^a   Kampherbeek, B J ^a   Wieland, M J ^a   De Boer, G ^a   Ten Berge, G F ^a   Boers, J ^a   Jager, R ^a   Van De Peut, T ^a   Peijster, J J M ^a   Slot, E ^a   Steenbrink, S W H K ^a   Teepen, T F ^a   Van Veen, A H V ^a  

^a MAPPER Lithography BV   (Netherlands)

Author keywords

Exposure results; MAPPER; Maskless lithography

Indexed keywords

300 MM WAFERS; 45-NM HALF-PITCH; BRIDGING TECHNOLOGY; CHIP-MANUFACTURING; DEVICE ENGINEERING; DOUBLE PATTERNING; ELECTRON BEAM DIRECT WRITE; ELECTRON BEAM WRITING; ELECTRON-BEAM COLUMNS; EUV LITHOGRAPHY; EXPOSURE RESULTS; HIGH THROUGHPUT; MAPPER; MASK LESS; MASK WRITING; MASKLESS LITHOGRAPHY; OPTICAL DATA; OPTICAL LITHOGRAPHY; SEMICONDUCTOR INDUSTRY; TECHNICAL VIABILITY; TECHNOLOGY-BASED; WAFER HANDLERS; MASK-LESS LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; THROUGHPUT; ULTRAVIOLET DEVICES; EXTREME ULTRAVIOLET LITHOGRAPHY; MANUFACTURE; PHOTOMASKS; TECHNOLOGY;

INTEGRATED OPTOELECTRONICS; THROUGHPUT;

EID: 69949134589     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.835188     Document Type: Conference Paper

References (2)

1. B. J. Lin, presentation Sematech Lithography workshop 2008, Bolton Landing.
2. E. Slot et al., Proc. of SPIE Vol. 6921, 69211P, (2008).