MAPPER: High throughput maskless lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7637, Issue , 2010, Pages

  Wieland, M J ^a   De Boer, G ^a   Ten Berge, G F ^a   Van Kervinck, M ^a   Jager, R ^a   Peijster, J J M ^a   Slot, E ^a   Steenbrink, S W H K ^a   Teepen, T F ^a   Kampherbeek, B J ^a  

^a MAPPER Lithography BV   (Netherlands)

Author keywords

EBDW; electron beam; lithography; MAPPER; maskless; massively parallel

Indexed keywords

300 MM WAFERS; CLUSTER CONFIGURATIONS; CMOS MANUFACTURING; CURRENT SYSTEM; DOUBLE PATTERNING; ELECTRON BEAM WRITING; HIGH THROUGHPUT; MASK LESS; MASK-LESS LITHOGRAPHY; OPTICAL DATA; TECHNOLOGY-BASED;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; TECHNOLOGY;

THROUGHPUT;

EID: 77953315096     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.849480     Document Type: Conference Paper

References (6)

1. B. J. Lin, Proc. Of SPIE Vol. 6520-02, (2007)
2. E. Slot et al., Proc. of SPIE Vol. 6921, 69211P, (2008)
3. M.J. Wieland et al., Proc. of SPIE Vol. 7271, 72710O1, (2009)
4. S.W.H.K. Steenbrink et al, Proc Spie 6921 (2008)
5. M.J. Wieland et al., Proc. of SPIE Advanced Lithography 2010, to be published.
6. S.Y. Lin et al., Proc. of SPIE Advanced Lithography 2010, to be published