Comparison of resist collapse properties for deep ultraviolet and 193 nm resist platforms

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3303-3307

  Cao, Heidi B ^a   Nealey, Paul F ^a   Domke, Wolf Dieter ^b  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLICS; OLEFINS; SCANNING ELECTRON MICROSCOPY; SUPERCRITICAL FLUIDS; SURFACE TENSION; THERMODYNAMIC STABILITY; ULTRAVIOLET RADIATION;

CRITICAL ASPECT RATIO OF COLLAPSE (CARC);

PHOTORESISTS;

EID: 0034317289     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321280     Document Type: Article

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