High power EUV lithography sources based on gas discharges and laser produced plasmas

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 119-129

  Stamm, U ^a   Ahmad, I ^a   Balogh, I ^a   Birner, H ^a   Bolshukhin, D ^a   Brudermann, J ^a   Enke, S ^a   Flohrer, F ^a   Gabel K ^a   Gotze S ^a   Hergenhan, G ^a   Kleinschmidt, J ^a   Klopfel D ^a   Korobotchko, V ^a   Ringling, J ^a   Schriever, G ^a   Tran, C D ^a   Ziener, C ^a  

^a XTREME Technologies GmbH   (Germany)

Author keywords

EUV lithography; EUV sources; Gas discharge produced plasma; Laser produced plasma; Z pinch

Indexed keywords

ELECTRIC DISCHARGES; IONIZATION; LASER PRODUCED PLASMAS; LIGHT SOURCES; SEMICONDUCTOR DEVICE MANUFACTURE; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; EXTREME ULTRAVIOLET SOURCES; GAS DISCHARGE PRODUCED PLASMA; SEMICONDUCTOR CHIP MANUFACTURING; Z PINCH;

LITHOGRAPHY;

EID: 0141836157     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482676     Document Type: Conference Paper

References (6)

1. S. Owa, "EUV source requirements", SEMATECH International EUV Source Workshop, 23 February 2003, Santa Clara, CA, USA
2. H.M. Hertz, M. Bergland, B.A.M. Hansson, L. Rymell, Proc. SPIE 3767, No. 01, 2-9 (1999)
3. G. Schriever, M. Rahe, U. Stamm, D. Basting, O. Khristoforov, V. Vinokhodov, V. Borisov, "Compact Z-pinch EUV source for photolithography", Proc. SPIE 4343, 615 - 620 (2001)
4. U. Stamm, I. Ahmad, V. Borisov, K. Gäbel, S. Götze, A. Ivanov, O. Khristoforov, J. Kleinschmidt, V. Korobochko, J. Ringling, G. Schriever, A. Vinokhodov, "High Power EUV sources for lithography", 3rd International Workshop on EUV Lithography, 29-30 October 2001, Kunibiki Messe, Matsue-shi, Shimane, Japan
5. V.M. Borisov, U. Stamm, I. Ahmad, S. Goetze, A.S. Ivanov, O.B. Khristoforov, J. Kleinschmidt, V. Korobotchko, J. Ringling, G. Schriever, A.Y. Vinokhodov, "Development of high power EUV sources for lithography", Proc. SPIE 4688, 626-633 (2002).
6. U. Stamm, I. Ahmad, V.M. Borisov, F. Flohrer, K. Gäbel, S. Götze, A.S. Ivanov, O.B. Khristoforov, D. Klöpfel, P. Köhler, J. Kleinschmidt, V. Korobotchko, J. Ringling, G. Schriever, A.Y. Vinokhodov, "High power EUV sources for lithography - A comparison of laser produced plasma and gas discharge produced plasma", Proc. SPIE 4688, 122-133 (2002).