Actinie detection of multilayer defects on EUV mask blanks using LPP light source and dark-field imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 271-280

  Tezuka, Yoshihiro ^a   Ito, Masaaki ^a   Terasawa, Tsuneo ^a   Tomie, Toshihisa ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Actinic inspection; EUV; LPP; Mask blanks; Multilayer; Phase defect; Surface roughness

Indexed keywords

CHARGE COUPLED DEVICES; CRYSTAL DEFECTS; IMAGE ANALYSIS; IMAGING TECHNIQUES; LASER PRODUCED PLASMAS; LIGHT SOURCES; MASKS; MULTILAYERS; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

ACTINIC INSPECTION; EUV; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; LASER PRODUCED PLASMA (LPP); LPP; MASK BLANKS; PHASE DEFECTS;

PHOTOLITHOGRAPHY;

EID: 3843114387     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534915     Document Type: Conference Paper

References (9)

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