Organoelement resists for EUV lithography

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 1193-1202

  Dai, Junyan ^a   Ober, Christopher K ^a   Wang, Lin ^b   Cerrina, Franco ^b   Nealey, Paul ^c  

^a Cornell University   (United States)

^b University of Wisconsin Madison   (United States)

^c UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

Boron containing resists; EUV lithography; EUV resists; Silicon containing resists

Indexed keywords

BLOCK COPOLYMERS; ETCHING; SEMICONDUCTING BORON; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; ULTRAVIOLET RADIATION;

ORGANOELEMENT RESISTS;

PHOTORESISTS;

EID: 0036030281     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474197     Document Type: Article

References (7)

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3. H. Yuki, Y. Okamoto and H. Takano, Polymer J., 2, 663, 1971.
4. T. Heying, J. Ager, S. Clark, D. Mangold, H. Goldstein, M. Hillman, R. Polak, J. Szymanski, Inorganic Chemistry, 2, 1089, 1963.
5. T. Heying, J. Ager, S. Clark, R. Alexander, S. Papetti, J. Reid, S. Trotx, Inorganic Chemistry, 2, 1097, 1963.
6. EUV transmission can be calculated at http://www-cxro.lbl.gov/optical_constants/filter2.html.
7. S. Mirviss, Organic and Biological Chemistry, 83, 3051, 1961.