Development status of EUV sources for use in Beta-tools and high-volume chip manufacturing tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Stamm, U ^a   Kleinschmidt, J ^a   Bolshukhin, D ^a   Brudermann, J ^a   Hergenhan, G ^b   Korobotchko, V ^a   Nikolaus, B ^a   Schurmann M C ^a   Schriever, G ^a   Ziener, C ^b   Borisov, V M ^c  

^a XTREME Technologies   (Germany)

^b XTREME Technologies   (Germany)

^c TROITSK INSTITUTE FOR INNOVATION AND FUSION RESEARCH   (Russian Federation)

Author keywords

EUV lithography; EUV sources; Gas discharge produced plasma; Rotating disc electrode; Tin; Xenon; Z pinch

Indexed keywords

CONTAMINATION; ELECTRODES; INTEGRATED CIRCUIT LAYOUT; SOLAR COLLECTORS; TIN; XENON;

EUV LITHOGRAPHY; EUV SOURCES; GAS DISCHARGE PRODUCED PLASMA; ROTATING DISC ELECTRODE; Z-PINCH;

PLASMAS;

EID: 33745608707     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.652989     Document Type: Conference Paper

References (10)

1. U. Stamm, "Extreme ultraviolet light sources for use in semiconductor lithography - state of the art and future development", J. Phys. D: Appl. Phys. 37 (2004) 3244-3253
2. G. Schriever, M. Rahe, U. Stamm, D. Basting, O. Khristoforov, A. Vinokhodov, V. Borisov, "Compact Z-pinch EUV source for photolithography Proc. SPIE 4343 (2001) 615-620
3. U. Stamm, I. Ahmad, I. Balogh, H. Birner, D. Bolshukhin, F. Flohrer, K. Gäbel, S. Götze, G. Hergenhan, J. Kleinschmidt, D. Klöpfel, P. Köhler, V. Korobotchko, J. Ringling, G. Schriever, C. D. Tran, "High power EUV lithography sources based on gas discharges and laser-produced plasmas", Proc. SPIE 5037 (2003) 119-129
4. A. Brunton, J.S. Cashmore, P. Elbourn, G. Elliner, M.C. Gower, P. Gruenewald, M. Harman, S. Hough, N. McEntee, S. Mundair, D. Rees, P. Richards, V. Truffert, I. Wallhead, M.D. Whitfield, Exitech Ltd., "High-resolution EUV imaging tools for resist exposure and aerial image monitoring", Proc. SPIE no. 5751 no. 6 (2005)
5. th International Symposium on EUV Lithography, 07-10 November 2005, San Diego, CA, USA, website https://www.sematech.org/7470
6. th International Symposium on EUV Lithography, 07-10 November 2005, San Diego, CA, USA, website https://www.sematech.org/7470
7. th International Symposium on EUV Lithography, 07-10 November 2005, San Diego, CA, USA, website https://www.sematech.org/7470
8. U. Stamm, J. Kleinschmidt, K. Gäbel, G. Hergenhan, C. Ziener, G. Schriever, I. Ahmad, D. Bolshukhin, J. Brudermann, R. de Bruijn, T. D. Chinh, A. Geier, S. Götze, A. Keller, V. Korobotchko, B. Mader, J. Ringling, T. Brauner, "EUV sources for EUV lithography in alpha-, beta- and high volume chip manufacturing: An update on GDPP and LPP technology", Proc. SPIE 5751 (2005) 236-247
9. U. Stamm, J. Kleinschmidt, K. Gäbel, G. Hergenhan, C. Ziener, I. Ahmad, D. Bolshukhin, V. Korobotchko, A. Keller, A. Geier, J. Ringling, C. D. Tran, B. Mader, R. de Bruijn, S. Götze, J. Brudermann, G. Schriever, "Development status of gas discharge produced plasma Z-pinch EUV sources for use in beta-tools and high volume chip manufacturing tools", Proc. SPIE 5751 (2005) 829-839
10. rd International Symposium on EUV Lithography, 01-04 November 2004, Miyazaki, Japan, website https://www.sematech.org