A two-dimensional model of the deformation of photoresist structures using elastoplastic polymer properties

Journal of Applied Physics

Volumn 96, Issue 4, 2004, Pages 1857-1865

  Yoshimoto, K ^a   Stoykovich, M P ^a   Cao, H B ^a,b   De Pablo, J J ^a   Nealey, P F ^a   Drugan, W J ^a  

^a University of Wisconsin Madison   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM BENDING; ELASTOPLASTIC BEAMS; POLYMER BEAMS; WET CHEMICAL PROCESSING;

CAPILLARITY; ELASTIC MODULI; ELASTICITY; ELASTOPLASTICITY; MATHEMATICAL MODELS; MICROSTRUCTURE; PLASTIC DEFORMATION; SEMICONDUCTOR MATERIALS; SUBSTRATES; SURFACE TENSION; THERMODYNAMICS;

PHOTORESISTORS;

EID: 4344634864     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1768614     Document Type: Article

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