Nikon EUVL development progress summary

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Miura, Takaharu ^a   Murakami, Katsuhiko ^a   Suzuki, Kazuaki ^a   Kohama, Yoshiaki ^a   Ohkubo, Yukiharu ^a   Asami, Takeshi ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

EUV exposure tool; EUV pre production tool; EUVA project; EUVL; Extreme Ultra Violet Lithography

Indexed keywords

LIGHT SOURCES; MASKS; POLISHING; PRODUCT DESIGN; PRODUCT DEVELOPMENT;

EUV EXPOSURE TOOL; EUV PRE-PRODUCTION TOOL; EUVA PROJECT; EXTREME ULTRA VIOLET LITHOGRAPHY (EUVL);

LITHOGRAPHY;

EID: 33745612430     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656243     Document Type: Conference Paper

References (10)

1. C. Gwyn et al., "Extreme Ultraviolet Lithography, A White Paper", EUV LLC (1999).
2. T. Oshino, et al., Proc SPIE, 5374, 141 (2004).
3. T. Oshino, et al., J. Vac. Sci. Technol., B22, 2975 (2004).
4. K. Ota, et al., Proc SPIE, 4343, 8 (2001).
5. th International EUVL Symposium, San Diego, (2005).
6. th International EUVL Symposium, San Diego, (2005).
7. M. Shiraihsi, et al., Proc SPIE, 5374, 104 (2004).
8. H.Takino, et al., Proc SPIE, 4688,75 (2002).
9. K. Ota, "A New Concept of EUV Reticle Particle Protection in Handling, and New Carrier Standard Proposal", EUV mask Technology & Standards Workshop, Miyazaki, (2004).
10. th International EUVL Symposium, San Diego, (2005).