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Volumn 5567, Issue PART 2, 2004, Pages 791-799

Actinic detection and signal characterization of multilayer defects on EUV mask blanks

Author keywords

Actinic inspection; Detection algorithm; EUV; Mask blanks; Phase defect

Indexed keywords

ALGORITHMS; ATOMIC FORCE MICROSCOPY; CAMERAS; CHARGE COUPLED DEVICES; CORRELATION METHODS; IMAGING TECHNIQUES; MASKS; MULTILAYERS; ULTRAVIOLET RADIATION;

EID: 19844380017     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.568379     Document Type: Conference Paper
Times cited : (30)

References (10)
  • 1
    • 3843114387 scopus 로고    scopus 로고
    • Actinic detection of multilayer defects on EUV mask blanks using LPP light source and dark-field imaging
    • Y. Tezuka, M. Ito, T. Terasawa and T. Tomie, "Actinic detection of multilayer defects on EUV mask blanks using LPP light source and dark-field imaging", Proceedings of SPIE, Vol. 5374, p271, 2004.
    • (2004) Proceedings of SPIE , vol.5374 , pp. 271
    • Tezuka, Y.1    Ito, M.2    Terasawa, T.3    Tomie, T.4
  • 7
    • 0141611926 scopus 로고    scopus 로고
    • Design and development of a novel actinic inspection tool for EUV multilayer-coated mask blanks
    • Y. Tezuka, M. Ito, T. Terasawa and T. Tomie, "Design and development of a novel actinic inspection tool for EUV multilayer-coated mask blanks", Proceedings of SPIE Vol. 5038, p866, 2003.
    • (2003) Proceedings of SPIE , vol.5038 , pp. 866
    • Tezuka, Y.1    Ito, M.2    Terasawa, T.3    Tomie, T.4
  • 8
    • 11844280377 scopus 로고    scopus 로고
    • Actinic detection and screening of multilayer defects on EUV mask blanks using dark-field imaging
    • Y. Tezuka, M. Ito, T. Terasawa and T. Tomie, "Actinic Detection and Screening of Multilayer Defects on EUV Mask Blanks using Dark-field Imaging", Proceedings of SPIE Vol. 5446, 5446-82, 2004.
    • (2004) Proceedings of SPIE , vol.5446 , pp. 5446-5482
    • Tezuka, Y.1    Ito, M.2    Terasawa, T.3    Tomie, T.4
  • 10
    • 0034316881 scopus 로고    scopus 로고
    • At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscope
    • T. Haga, H. Takenaka, and M. Fukuda, "At-wavelength extreme ultraviolet lithography mask inspection using a Mirau interferometric microscope", J. Vac. Sci Technol. B, 18, p2916, 2000.
    • (2000) J. Vac. Sci Technol. B , vol.18 , pp. 2916
    • Haga, T.1    Takenaka, H.2    Fukuda, M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.