Step-and-repeat process for thermal nanoimprint lithography

Nanotechnology

Volumn 21, Issue 10, 2010, Pages

  Yoon, Hyunsik ^a   Cho, Hye Sung ^a   Suh, Kahp Y ^a   Char, Kookheon ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER BLOCKS; HALOGEN LAMPS; INFRA RED; METAL SCREENS; PATTERN COLLAPSE; SELECTIVE HEATING; STEP-AND-REPEAT; THERMAL NANOIMPRINT LITHOGRAPHY; TRANSPARENT POLYMER; YOUNG'S MODULUS;

INFRARED RADIATION; POLYSTYRENES; SPIN GLASS;

NANOIMPRINT LITHOGRAPHY;

POLYMER; POLYSTYRENE DERIVATIVE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; INFRARED RADIATION; METHODOLOGY; NANOTECHNOLOGY; PRINTING; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; THEORETICAL MODEL;

INFRARED RAYS; MEMBRANES, ARTIFICIAL; MICROSCOPY, ELECTRON, SCANNING; MODELS, THEORETICAL; NANOTECHNOLOGY; POLYMERS; POLYSTYRENES; PRINTING; TEMPERATURE;

EID: 77149179739     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/10/105302     Document Type: Article

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