Single molecule chemically amplified resists based on ionic and non-ionic PAGs

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Lawson, Richard A ^a   Lee, Cheng Tsung ^a   Yueh, Wang ^b   Tolbert, Laren ^c   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

^b INTEL CORPORATION   (United States)

^c GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Chemically amplified photoresist; High PAG loading; Line edge roughness; Molecular resist; PAG bound molecular resist; Photoacid generator; Single component resist; Single molecule resist

Indexed keywords

CHEMICALLY AMPLIFIED PHOTORESIST; HIGH PAG LOADING; LINE EDGE ROUGHNESS; MOLECULAR RESIST; PAG BOUND MOLECULAR RESIST; PHOTOACID GENERATOR; SINGLE COMPONENT RESIST; SINGLE MOLECULE RESIST;

ACIDS; ELECTRON BEAM LITHOGRAPHY; EXTREME ULTRAVIOLET LITHOGRAPHY; MOLECULES; PHOTORESISTORS; ROUGHNESS MEASUREMENT;

PHOTORESISTS;

EID: 57349127346     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773570     Document Type: Conference Paper

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