Implementing flare compensation for EUV masks through localized mask CD resizing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 58-68

  Krautschik, Christof ^a   Chandhok, Manish ^b   Zhang, Guojing ^c   Lee, Sang ^b   Goldstein, Michael ^b   Panning, Eric ^b   Rice, Bryan ^b   Bristol, Robert ^b   Singh, Vivek ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b INTEL CORPORATION   (United States)

^c INTEL RESEARCH   (United States)

Author keywords

Adaptive grid; CD compensation; CD control; Convolution; Engineering test stand (ETS); Flare; Flare point spread function (PSF); Light scatter; Mask density change

Indexed keywords

COMPUTER SIMULATION; LIGHT SCATTERING; MASKS; OPTICAL TRANSFER FUNCTION; OPTICS; STANDARDS; ULTRAVIOLET RADIATION;

CRITICAL DIMENSION COMPENSATION; CRITICAL DIMENSION CONTROL; EXTREME ULTRAVIOLET MASKS; FLARE COMPENSATION; FLARE POINT-SPREAD FUNCTION; MASK CRITICAL DIMENSION RESIZING;

PHOTOLITHOGRAPHY;

EID: 0141459709     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482344     Document Type: Conference Paper

References (4)

1. Christof Krautschik, "Impact of Flare on the Imaging Performance of an EUV Exposure Tool", presented at the 5th NGL Workshop, Pasadena, CA, Aug. 2001.
2. D.G. Stearns, D.P. Gaines, D.W. Sweeny, and E.M. Gullikson, "Nonspecular X-Ray Scattering in a Multi-Layer-Coated Imaging System", Journal of Applied Physics, Vol84, No.5, July 15, 1998.
3. Christof Krautschik, Masaaki Ito, Iwao Nishiyama, and Shinji Okazaki, "Impact of EUV light scatter on CD control as a result of mask density changes," SPIE ML 4688-34, 2002.
4. Sang H. Lee, Patrick Naulleau, Christof Krautschik, Manish Chandhok, Eric M. Gullikson, Henry N. Chapman, Donna J. O'Connell, Michael Goldstein, "Lithographic flare measurement of EUV full-field projection optics, SPIE, ML5037-13 2003.