Pattern inspection of EUV masks using DUV light

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 1065-1072

  Liang, Ted ^a   Tejnil, Edita ^a   Stivers, Alan ^a  

^a INTEL CORPORATION   (United States)

Author keywords

EUV lithography; EUV masks; Mask inspection; Soft defect printability and inspection

Indexed keywords

IMPURITIES; INSPECTION; LITHOGRAPHY; PATTERN RECOGNITION;

MASK INSPECTION;

MASKS;

EID: 0037965846     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467298     Document Type: Conference Paper

References (9)

1. Alan Stivers, et al, "Materials Selection for EUV Mask", Advanced Reticle Symposium, San Jose, CA, 1999.
2. Ted Liang, Alan Stivers, Pei-Yang, Yan, Edita Tejnil and Guojing Zhang, "Enhanced Optical Inspectability of Patterned EUVL Mask," Proceedings of SPIE Vol. 4562, Giang T. Dao and Brian J. Grenon (eds.), pp. 288-96, 2002.
3. Alan Stivers, Ted Liang, Michael Penn, Barry Lieberman, Gil Shelden, Jim Folta, Cindy Larson, Paul Mirkarimi, Chris Walton, Eric Gullikson and Moonsuk Yi, "Evaluation of the Capability of a Multibeam Confocal Inspection System for Inspection of EUVL Mask Blanks," Proceedings of SPIE Vol. 4889, Brian J. Grenon and Kurt R. Kimmel (eds.), paper, 2003.
4. Edita Tejnil, "Comparison of EUV, DUV, and Electron-beam Inspection Sensitivities to Detecting Defects on EUV Mask Multilayer Surfaces", Internal Technical Memorandum, Intel Corporation, March 1999.
5. Alan Stivers and Edita Tejnil, "Method and Apparatus for a Reflective Mask that is Inspected at a First Wavelength and Exposed during Semiconductor Manufacturing at a Second Wavelength," US Patent No. 6,410,193, 2002.
6. Donald Pettibone and Stan Stokowski, "Optical Inspection of EUV and SCALPEL Reticles", SPIE, Vol. 4409, pp. 710-717, (PMJ 2001).
7. Donald Pettibone, Andrei Veldman, Ted Liang, Alan R. Stivers, Pawitter Mangat, Bing Lu, Scott Hector, James Wasson, Kenneth Blaedel, Emily Fisch, and David M. Walker, "Inspection of EUV Reticles", in Emerging Lithographic Technologies VI, SPIE Vol. 4688, pp. 363-374, 2002.
8. Ted Liang and Alan Stivers, "Damage-free Mask Repair Using Electron Beam Induced Chemical Reactions", Paper 4688-43, SPIE 2002.
9. J.H. Underwood, E.M. Gullikson, and K. Nguyen, Tarnishing of Mo/Si multilayer x-ray mirrors, Applied Optics 32, 6985-6990 (1993).