Novel low thermal expansion material for EUV application

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Kawata, Mitsuhiro ^a   Takada, Akira ^a   Hayashi, Hideaki ^a   Sugimoto, Naoki ^a   Kikugawa, Shinya ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

Low thermal expansion; Silica glass; Structural chemistry

Indexed keywords

FUSED SILICA; OXIDES; SUBSTRATES; THERMAL EXPANSION; TIN; ULTRAVIOLET RADIATION;

LOW COEFFICIENT OF THERMAL EXPANSION (CTE); LOW THERMAL EXPANSION; LOW THERMAL EXPANSION MATERIALS; STRUCTURAL CHEMISTRY;

PHOTOLITHOGRAPHY;

EID: 33745634843     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655931     Document Type: Conference Paper

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