Long-term stability of Ru-based protection layers in extreme ultraviolet lithography: A surface science approach

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 4, 2007, Pages 1123-1138

  Over, H ^a   He, Y B ^a   Farkas, A ^a   Mellau, G ^a   Korte, C ^a   Knapp, M ^a   Chandhok, M ^b   Fang, M ^b  

^a JUSTUS LIEBIG UNIVERSITY   (Germany)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; MICROSTRUCTURE; MIRRORS; REFLECTION; ULTRAVIOLET RADIATION;

CAPPING LAYER MATERIALS; MIRROR REFLECTIVITY; MULTILAYER STACKS; SURFACE CONTAMINATION;

RUTHENIUM;

EID: 34547604850     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2743648     Document Type: Article

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