Liquid-xenon-jet laser-plasma source for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4506, Issue , 2001, Pages 1-8

  Hansson, Björn A M ^a,b   Rymell, Lars ^a   Berglund, Magnus ^a   Hemberg, Oscar ^a,b   Janin, Emmanuelle ^a   Thoresen, Jalmar ^a   Hertz, Hans M ^b  

^a Innolite AB   (Sweden)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

EUV lithography; Laser produced plasma; Liquid jet; Xenon

Indexed keywords

DEGRADATION; ELECTROMAGNETIC WAVE EMISSION; JETS; LASER PRODUCED PLASMAS; LASER PULSES; LITHOGRAPHY; MIRRORS; NOZZLES; SPECTRUM ANALYSIS; ULTRAVIOLET RADIATION; XENON;

EXTREME-ULTRAVIOLET (EUV) LITHOGRAPHY; LIQUID-JET LASER-PLASMA SOURCES;

PLASMA SOURCES;

EID: 0035762149     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.450943     Document Type: Article

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