EUV into production with ASML's NXE platform

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Wagner, Christian ^a   Harned, Noreen ^a   Kuerz, Peter ^b   Lowisch, Martin ^b   Meiling, Hans ^a   Ockwell, David ^a   Peeters, Rudy ^a   Van Ingen Schenau, Koen ^a   Van Setten, Eelco ^a   Stoeldraijer, Judon ^a   Thuering, Bernd ^b  

^a ASML   (Netherlands)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

EUV lithography; imaging; masks; resist; Sn source

Indexed keywords

3RD GENERATION; COST-EFFECTIVE SOLUTIONS; EUV LITHOGRAPHY; GENERATION TOOLS; HIGH VOLUME MANUFACTURING; KEY FEATURE; OFF-AXIS ILLUMINATION; PERFORMANCE DATA; PROCESS DEVELOPMENT; PROCESS IMPLEMENTATION; PRODUCTION TOOLS; RESEARCH CENTER; VOLUME PRODUCTION;

DRILLING PLATFORMS; FREIGHT TRANSPORTATION; NANOTECHNOLOGY; PRODUCTION PLATFORMS; PRODUCTIVITY; TIN;

LITHOGRAPHY;

EID: 77953429920     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.845700     Document Type: Conference Paper

References (5)

1. H. Meiling et al., "EUV System - Moving towards Production", SPIE Symposium on emerging Lithographic Technologies, 7271 (2009).
2. th International Symposium on Extreme Ultraviolet Lithography, Prague (2009).
3. Van Steenwinckel, D. et al., "A Novel Method for Characterizing Resist Performance," Proc. SPIE 6519, 65190V-1, (2007) (Pubitemid 47551050)
4. M. Lowisch, et al., "Optics for EUV production", SPIE Symposium on Extreme Ultraviolet (EUV) Lithography, 7636 (2010).
5. D. Brandt, et al., "LPP source system development for HVM", SPIE Symposium on Extreme Ultraviolet (EUV) Lithography, 7636 (2010).