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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue 1, 2001, Pages 19-37

System integration and performance of the EUV engineering test stand

(30) Tichenor, Daniel A a Ray Chaudhuri, Avijit K a Replogle, William C a Stulen, Richard H a Kubiak, Glenn D a Rockett, Paul D a Klebanoff, Leonard E a Jefferson, Karen L a Leung, Alvin H a Wronosky, John B b Hale, Layton C c Chapman, Henry N c Taylor, John S c Folta, James A c Montcalm, Claude c Soufli, Regina c Spiller, Eberhard c Blaedel, Kenneth c Sommargren, Gary E c Sweeney, Donald W c more..

a SANDIA NATIONAL LABORATORIES (United States)

b SANDIA NATIONAL LABORATORIES (United States)

c LAWRENCE LIVERMORE NATIONAL LABORATORY (United States)

d LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

e MOTOROLA INC (United States)

f Intei Corporation (United States)

Author keywords

EUVL; Laser plasma source; Laser produced plasma; Lithography; Maglev; Magnetic levitation; Multilayer coatings; Optical design; Optical fabrication; Precision engineering; Stages

Indexed keywords

IMAGE ANALYSIS; LASER PRODUCED PLASMAS; MAGNETIC LEVITATION; OPTICAL DESIGN; PRECISION ENGINEERING; PROJECTION SYSTEMS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); OPTICAL FABRICATION;

PHOTOLITHOGRAPHY;

EID: 0344440777 PISSN: 0277786X EISSN: None Source Type: Journal
DOI: 10.1117/12.436665 Document Type: Article

Times cited : (61)

References (16)

1
- 0033725373
- EUV engineering test stand
- Emerging Lithographic Technologies IV
- (2000) Proceeding of SPIE , vol.3997 , pp. 48-69
- Tichenor, D.A.¹ Kubiak, G.D.² Replogle, W.C.³ Klebanoff, L.E.⁴ Wronosky, J.B.⁵ Hale, L.C.⁶ Chapman, H.N.⁷ Taylor, J.S.⁸ Folta, J.A.⁹ Montcalm, C.¹⁰ Hudyma, R.M.¹¹ Goldberg, K.A.¹² Naulleau, P.¹³

2
- 0000330266
- High-NA camera for an EUVL microstepper
- (2000) Proceedings of the American Society for Precision Engineering , vol.22 , pp. 521-524
- Hale, L.C.¹ Hudyma, R.M.² Taylor, J.S.³ Thigpen, R.L.⁴ Jung, C.A.⁵

3
- 0033701350
- EUV interferometry of a four-mirror ring-field EUV optical system
- Emerging Lithographic Technologies IV
- (2000) Proceeding of SPIE , vol.3997 , pp. 867-873
- Goldberg, K.A.¹ Naulleau, P.² Batson, P.J.³ Denham, P.⁴ Anderson, E.H.⁵ Bokor, J.⁶ Chapman, H.N.⁷

4
- 84994441553
- these Proceedings
- First Environmental Data from the EUV Engineering Test Stand
- Klebanoff, L.E.¹ Malinowski, M.E.² Grunow, P.³ Clift, W.M.⁴ Steinhaus, C.⁵ Leung, A.H.⁶ Haney, S.J.⁷

5
- 0032654747
- Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography
- (1999) Proceedings of the SPIE , vol.3676 , pp. 669
- Kubiak, G.D.¹ Bernardez, L.J.² Krenz, K.³ Sweatt, W.C.⁴

6
- 0000499628
- Optimization of X-ray sources for proximity lithography produced by a high average power Nd:glass laser
- (1996) J. Appl. Phys. , vol.79 , pp. 8258
- Celliers, P.¹ Da Silva, L.B.² Dane, C.B.³ Mrowka, S.⁴ Norton, M.⁵ Harder, J.⁶ Hackel, L.⁷ Matthews, D.L.⁸ Fiedorowicz, H.⁹ Bartnik, A.¹⁰ Maldonado, J.R.¹¹ Abate, J.A.¹²

7
- 0020832081
- Spectra of Xe VII, VIII, and IX in the extreme ultraviolet: 4d-mp, nf transitions
- (1983) J. Opt. Soc. Am. , vol.73 , pp. 1325
- Blackburn, J.¹ Carroll, P.K.² Costello, J.³ O'Sullivan, G.⁴

8
- 84994441549
- Xenon liquid-jet laser-plasma source for EUV lithography
- Santa Clara, CA, February
- (2001) SPIE Conference on Microlithography
- Hansson, B.A.¹ Berglund, M.² Hemberg, O.³ Hertz, H.M.⁴

9
- 0033681615
- Wafer and reticle positioning system for the extreme ultraviolet lithography engineering test stand
- Emerging Lithographic Technologies IV
- (2000) Proceedings of SPIE , vol.3997 , pp. 829-839
- Wronosky, J.B.¹ Smith, T.G.² Craig, M.J.³ Sturgis, B.R.⁴ Darnold, J.R.⁵ Werling, D.K.⁶ Kincy, M.A.⁷ Tiehenor, D.A.⁸ Williams, M.E.⁹ Bischoff, P.¹⁰

10
- 0033701350
- EUV inteferometry of a four-mirror ring-field EUV optical system
- Emerging Lithographic Technologies IV
- (2000) Proceeding of SPIE , vol.3997 , pp. 867-873
- Goldberg, K.A.¹ Naulleau, P.² Batson, P.J.³ Denham, P.⁴ Anderson, E.H.⁵ Bokor, J.⁶ Chapman, H.N.⁷

11
- 0032402650
- A rigorous method for compensation selection and alignment of microlithographic optical systems
- (1998) Proceedings of SPIE , vol.3331 , pp. 102-113
- Chapman, H.N.¹ Sweeney, D.W.²

12
- 0032402999
- The fabrication and testing of optics for EUV projection lithography
- Emerging Lithographic Technologies II
- (1998) Proceedings of SPIE , vol.3331 , pp. 580-590
- Taylor, J.S.¹ Sommargren, G.E.² Sweeney, D.W.³ Hudyma, R.M.⁴

13
- 0002749804
- Sub-nanometer interferometry for aspheric mirror fabrication
- from Precision Science and Technology for Perfect Surfaces, Aug. 29-Sep. 1, Osaka, Japan, JSPE Publication Series No. 3
- (1999) Proc. Of the 9th International Conference on Precision Engineering (9th ICPE) , vol.1
- Sommargren, G.E.¹ Phillion, D.W.² Campbell, E.W.³

14
- 84994468739
- this Conference Proceedings
- Multilayer optics for an extreme ultraviolet lithography tool with 70 nm resolution
- Soufli, R.¹ Spiller, E.² Schmidt, M.A.³ Davidson, J.C.⁴ Grabner, R.F.⁵ Gullikson, E.M.⁶ Kaufmann, B.B.⁷ Baker, S.L.⁸ Chapman, H.N.⁹ Hudyma, R.M.¹⁰ Walton, C.C.¹¹ Montcalm, C.¹² Folta, J.A.¹³

15
- 0033358094
- Multilayer coated optics for an alpha-class extreme ultraviolet lithography system
- EUV, X-Ray, and Neutron Optics and Sources, S. P. Vernon and K. Goldberg, Eds
- (1999) Proceedings of SPIE , vol.3767 , pp. 210-216
- Montcalm, C.¹ Grabner, R.F.² Hudyma, R.M.³ Schmidt, M.A.⁴ Spiller, E.⁵ Walton, C.C.⁶ Wedowski, M.⁷ Folta, J.A.⁸

16
- 0040707392
- Comparison of the lithographic properties of positive resists upon exposure to deep- and extreme- ultraviolet radiation
- (1999) rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication , pp. 3384-3389
- Brainard, R.L.¹ Henderson, C.² Cobb, J.³ Rao, V.⁴ Mackevich, J.F.⁵ Okoroanyanwu, U.⁶ Gunn, S.⁷ Chambers, J.⁸ Connolly, S.⁹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.