Design and development of a novel actinic inspection tool for EUV multilayer-coated mask blanks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 II, Issue , 2003, Pages 866-877

  Tezuka, Yoshihiro ^a   Ito, Masaaki ^a   Terasawa, Tsuneo ^a   Tomie, Toshihisa ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Actinic inspection; EUV; LPP; Mask blanks; Multilayer; Phase defect; Surface roughness

Indexed keywords

INSPECTION; LASER PRODUCED PLASMAS; LITHOGRAPHY; SHOT NOISE; SURFACE ROUGHNESS;

EXTREME ULTRAVIOLET MULTILAYER-COATED MASK BLANKS; NEXT GENERATION LITHOGRAPHY; POWER SPECTRAL DENSITY;

MASKS;

EID: 0141611926     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483659     Document Type: Conference Paper

References (13)

1. E. M. Gullikson, C. Cerjan, D. G. Sterns, P. B. Mirkarimi and D. B. Sweeney, "Practical approach for modeling extreme ultraviolet lithography mask defects," J. Vac. Sci Technol. B, 20, p81, 2002.
2. A. Stivers, T. Liang, M. Penn, B. Lieberman, G. Shelden, J. Folta, C. Larson, P. Mirkarim, C. Walton, E. Gullikson and M. Yi, "Evaluation of the Capability of a Multibeam Confocal Inspection System for Inspection of EUVL Mask Blanks", Proceedings of SPIE Vol. 4889, p408, 2002.
3. S. Jeong, L. Johnson, Y. Lin, S. Rekawa, P. Yan, P. Kearney, E. Tejnil, J. Underwood and J. Bokor, "Actinic EUVL mask blank defect inspection system", Proceedings of SPIE Vol. 3676, p298, 1999.
4. M. Yi, T. Haga, C. Walton and J. Boker, "High sensitivity actinic detection of native defects in extreme ultraviolet lithography mask blanks", J. Vac. Sci. Technol. B, 19, p2401, 2001.
5. T. Tomie, "Proposal of fast actinic defect inspection of multilayer-coated mask using laser-produced plasma", Extended Abstracts of the Japan Society of Applied Physics, the 63rd Autumn meeting, No. 2, p612, 2002.
6. T. Tomie, T. Terasawa, Y. Tezuka and M. Ito, "Concept of ultra-fast at-wavelength inspection of defects on a multilayer mask using a laser-produced plasma source", Proceedings of SPIE, this proceeding, 2003.
7. H. Oizumi, I. Nishiyama, S. Shirayone, H. Yamanashi, E. Yano and S. Okazaki, "ASET-EUVL Beamline: Resolution-limit Evaluation of Microfield Exposure Tool for EUVL", Extended Abstracts of the Japan Society of Applied Physics, the 61st Autumn meeting, No. 2, p599, 2000.
8. M. Ito, Y. Tezuka and T. Terasawa, "Simulation of scattering from defects in EUV mask blanks", Proceedings of Microprocess and Nanotechnology Conference, p316, 2002.
9. E. M. Gullikson, "Scattering from normal incidence EUV optics", Proceedings of SPIE Vol.3331, p72, 1998.
10. SEMI P37-1102, "Specifications for Extreme Ultraviolet Lithography Mask Substrates", SEMI, 2001.
11. M. Born and E. Wolf, Principle of Optics, Pergamon Press Ltd, Oxford U.K., 1975.
12. E. M. Gullikson, S. Baker, J. Bjorkholm, J. Bokor, K. Goldberg, J. Goldsmith, C. Montcalm, P. Naulleau, E. Spiller, D. Sterns, J. Taylor, J. Underwood, "EUV Scattering and Flare of 10x Projection Cameras", Proceedings of SPIE, Vol.3676, p717, 1999.
13. E. L. Church and P. Z. Takacs, "Specification of surface figure and finish in terms of system performance", Applied Optics Vol.32, p3344, 1993, and the references therein.