Plasma sources for EUV lithography exposure tools

Journal of Physics D: Applied Physics

Volumn 37, Issue 23, 2004, Pages 3207-3212

  Banine, Vadim ^a   Moors, Roel ^a  

^a ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

FREE ELECTRON LASERS; HIGH TEMPERATURE EFFECTS; LASER PRODUCED PLASMAS; OPTICAL DESIGN; PLASMA SOURCES; PULSED LASER DEPOSITION; REFRACTIVE INDEX; SYNCHROTRONS; ULTRAVIOLET LAMPS; ULTRAVIOLET RADIATION;

COST OF OWNERSHIP (COO); CRITICAL DIMENSION (CD); EXPOSURE TOOLS; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

LITHOGRAPHY;

EID: 10644267839     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/23/001     Document Type: Article

References (17)

1. Stamm U et al 2003 High power discharge and laser produced plasma sources for EUV lithography 2nd Int. EUVL Symp. (Antwerp, Belgium, September 30-October 02, 2003)
2. Endo A et al 2003 Laser produced plasma light source for EUV lithography at EUVA 2nd Int. EUVL Symp. (Antwerp, Belgium, September 30-October 02, 2003)
3. Banine V et al 2003 Extreme ultra violate sources for lithography applications 2nd Int. EUVL Symp. (Antwerp, Belgium, September 30-October 02, 2003)
4. Pankert J 2003 Philips' EUV lamp: status and roadmap 2nd Int. EUVL Symp. (Antwerp, Belgium, September 30-October 02, 2003)
5. Fomenkov I 2003 Performance of a dense plasma focus light source for EUV lithography 2nd Int. EUVL Symp. (Antwerp, Belgium, September 30-October 02, 2003)
6. Partlo W et al 1999 Proc. SPIE 3676 846
7. Attwood D 1999 Soft X-Rays and Extreme Ultraviolet Radiation, Principles and Applications (Cambridge: Cambridge University Press)
8. Banine V et al 2000 Comparison of extreme ultraviolet sources for lithography applications Microelectron. Eng. 53 681-4
9. Banine V et al 2000 Relationship between an EUV source and the performance of an EUV lithographic system Proc. SPIE 3997 126-35
10. Stuik R et al 1999 Peak and integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multi-layer, multi-element optics for extreme ultraviolet lithography J. Vac. Sci. Technol. B 17 2998-3002
11. http://www-cxro.lbl.gov/optical.constants/gastrn2.html
12. Sluijk B et al 2001 Performance results of a new generation of 300-mm lithography systems Proc. SPIE 4346 544-57
13. Gwyn C et al 1999 EUV LLC White paper, Livermore, CA, USA
14. Wolfe W L 1998 Introduction to Radiometry Tutorial Text in Optical Engineering Proc. SPIE TT29 17
15. Derra G and Singer W 2003 Collection efficiency of EUV sources Proc. SPIE 5037 728-41
16. van den Brink et al 1996 Step-and-scan and step-and-repeat. A Technology Comparison Proc. SPIE 2726 734-53
17. Koshelev K N and Pereira N R 1991 J. Appl. Phys. 69 R21