EUVL mask manufacturing-technologies and results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  Letzkus, Florian ^a   Butschke, Joerg ^a   Irmscher, Mathias ^a   Sailer, Holger ^a   Dersch, Uwe ^b   Holfeld, Christian ^b  

^a Institut fur Mikroelektronik Stuttgart   (Germany)

^b Advanced Mask Technology Center   (Germany)

Author keywords

Absorber; Buffer; Dry etch; EUV mask; Proximity correction

Indexed keywords

ANTIREFLECTION COATINGS; MIRRORS; OPTIMIZATION; PHOTOLITHOGRAPHY; REFLECTION; THICK FILMS; ULTRAVIOLET RADIATION;

ABSORBER; BUFFER; DRY ETCH; EUV MASK; PROXIMITY CORRECTION;

MASKS;

EID: 33644589340     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.628957     Document Type: Conference Paper

References (9)

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