Surface conditioning solutions for pattern collapse reduction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 2, 2004, Pages 807-812

  Zhang, Peng ^a   Jaramillo Jr , Manuel ^a   King, Danielle M ^a   Rao, Madhukar B ^a   O'Brien, Bridget L ^a   Ross, Brenda F ^a  

^a AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

248 nm process; Defect level; Pattern collapse; Surface conditioning solution

Indexed keywords

ASPECT RATIO; OPTIMIZATION; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SURFACE ROUGHNESS; THICKNESS MEASUREMENT;

248 NM PROCESS; DEFECT LEVELS; PATTERN COLLAPSE; SURFACE CONDITIONING SOLUTION;

LASER OPTICS;

EID: 3843125224     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535283     Document Type: Conference Paper

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