Use of molecular oxygen to reduce EUV-induced carbon contamination of optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 347-356

  Malinowski, M ^a   Grunow, P ^a   Steinhaus, C ^a   Clift, M ^a   Klebanoff, L ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Carbon cleaning with oxygen; Carbon deposition; ETS; Extreme ultraviolet; Multilayer mirror

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON; DEPOSITION; LIGHT SOURCES; MIRRORS; OXYGEN; PHOTOEMISSION; PHOTOLITHOGRAPHY;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

ULTRAVIOLET RADIATION;

EID: 0034757341     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436677     Document Type: Conference Paper

References (16)

1. Beam line chemistry