Plasma etch method for extreme ultraviolet lithography photomask

Applied Physics Letters

Volumn 90, Issue 6, 2007, Pages

  Wu, Banqiu ^a   Kumar, Ajay ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBER LAYERS; PHOTOMASK; ULTRAVIOLET LITHOGRAPHY;

GIBBS FREE ENERGY; MASKS; PLASMA ETCHING; VAPORIZATION;

PHOTOLITHOGRAPHY;

EID: 33846942606     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2470470     Document Type: Article

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