Enhanced optical inspectability of patterned EUVL mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 288-296

  Liang, Ted ^a   Stivers, Alan ^a   Yan, Pei Yang ^a   Tejnil, Edita ^a   Zhang, Guojing ^a  

^a INTEL CORPORATION   (United States)

Author keywords

EUV lithography; EUVL mask; Image contrast; Mask inspection; Multilayer blank; Surface treatment

Indexed keywords

DEFECTS; FABRICATION; IMAGE ANALYSIS; LIGHT ABSORPTION; LIGHT REFLECTION; MULTILAYERS; PHOTOLITHOGRAPHY; SURFACE TREATMENT; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) MASKS;

MASKS;

EID: 0035765795     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.458303     Document Type: Conference Paper

References (14)

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14. Private communications with Dr. D. Pettibone of KLA-Tencor.