EUV sources using Xe and Sn discharge plasmas

Journal of Physics D: Applied Physics

Volumn 37, Issue 23, 2004, Pages 3254-3265

  Borisov, Vladimir M ^a   Eltsov, Aleksander V ^a   Ivanov, Aleksander S ^a   Kiryukhin, Yuriy B ^a   Khristoforov, Oleg B ^a   Mishchenko, Valentin A ^a   Prokofiev, Aleksander V ^a   Vinokhodov, Aleksander Yu ^a   Vodchits, Vladimir A ^a  

^a TROITSK INSTITUTE FOR INNOVATION AND FUSION RESEARCH   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; ELECTRODES; LASER PRODUCED PLASMAS; LITHOGRAPHY; THERMAL LOAD; TIN; ULTRAVIOLET RADIATION; VAPORIZATION; XENON;

DEBRIS MITIGATION; DISCHARGE PRODUCED PLASMAS (DPP); EXTREME ULTRAVIOLET (EUV) SOURCES; HEAT REMOVAL;

PLASMA SOURCES;

EID: 10644227029     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/23/006     Document Type: Article

References (24)

1. Osa S 2003 EUV source requirements SEMATECH Int. EUV Source Workshop (Santa Clara, CA, USA)
2. McGeoch M W and Pike C T 2003 Star pinch scalable EUV source Proc. SPIE Int. Symp. on Emerging Lithographic Technologies VII (Santa Clara, CA, USA) vol 5037, pp 141-6
3. Fomenkov V et al 2003 Performance and scaling of a dense plasma focus light source for EUV lithography Proc. SPIE Int. Symp. on Emerging Lithographic Technologies VII (Santa Clara, CA, USA) vol 5037, pp 807-21
4. Pankert J et al 2003 Physical properties of the HCT EUV source Proc. SPIE Int. Symp. on Emerging Lithographic Technologies VII (Santa Clara, CA, USA) vol 5037, pp 112-18
5. Teramoto Y et al 2003 High repetition rate MPC generator-driven capillary Z-pinch EUV source Symp. on Pulsed Power and Plasma Applications (Nagaoka, Japan) pp 82-7
6. Stamm U et al 2003 High power EUV lithography sources based on gas discharges and laser-produced plasmas Proc. SPIE Int. Symp. on Emerging Lithographic Technologies VII (Santa Clara, CA, USA) vol 5073, pp 119-29
7. Borisov V et al 2003 Development of high conversion efficiency high power EUV sources for lithography 2nd Int. EUVL Symp. (Antwerp)
8. Stamm U et al 2002 High power EUV source for lithography - a comparison of laser produced plasma and gas discharge produced plasma Proc. SPIE 4688 122-33
9. Richardson M et al 2003 The case for tin as an EUV source 2nd Int. EUVL Symp. (Antwerp)
10. O'Sulivan G et al 2003 EUVL source optimization for 13.5 nm operation 2nd Int. EUVL Symp. (Antwerp)
11. Borisov V et al 2003 A comparison of EUV sources for lithography based on Xe and Sn EUV Source Workshop (Antwerp)
12. Koshelev K 2003 Alternative material Sn EUV Source Workshop (Antwerp)
13. Vasiliev V I, Komel'kov V S, Skvortsov Y and Tserevitinov S S 1960 Stable dynamic pinch J. Tech. Phys. XXX 7
14. Artsimovich L A 1961 Controlled fusion Phys.-Mat. Izdat. (Moscow)
15. Stamm U et al 2001 High power EUV sources for lithography 3rd Int. Workshop on EUV Lithography (Kunibiki Messe, Matsue-shi, Shimane, Japan, 29-30 October 2001)
16. Borisov V M etal 2002 High-power gas-discharge EUV source Plasma Phys. Rep. 28 877-81
17. Borisov V M et al 2002 Development of high power EUV sources for lithography Proc. SPIE 4688 626-33
18. Borisov V M, Vinokhodov A Yu, Ivanov A S, Kiryukhin Y B, Mishchenko V A, Prokofiev A V and Khristoforov O B 2004 High average power EUV source with X = 13.5 nm for next generation lithography Izvestiya Rossiiskoi Akademii Nauk. Seriya Fizicheskaya 68 no 4 503-8
19. Borisov V M and Khristoforov O B 2000 Method of producing short-wave radiation from a gas discharge plasma and device for implementing it Russian Patent No 2000117336
20. Arhipov N I et al 1999 Formation of a shielding layer near a solid target under the action of a high-power plasma flow Plasma Phys. Rep. 25 236-45
21. Borisov V M et al 2002 Russian Patent Application No 2002120301
22. Kusunose H 2003 Patent No VS6, 665,326 B2 Des. 16
23. Wang X J et al 1992 Experimental studies of laser-induced explosive electron emission Proc. XVISDEIV (Darmstadt)
24. Borisov V et al 1998 High average power excimer lasers Proc. 12th Int. Symp. on Gas Flow and Chemical Lasers and High-Power Laser Conf. (St Peterburg, Russia)