EUV engineering test stand

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 48-69

  Tichenor, Daniel A ^a   Kubiak, Glenn D ^a   Replogle, William C ^a   Klebanoff, Leonard E ^a   Wronosky, John B ^a   Hale, Layton C ^a   Chapman, Henry N ^a   Taylor, John S ^a   Folta, James A ^a   Montcalm, Claude ^a   Hudyma, Russell M ^a   Goldberg, Kenneth A ^a   Naulleau, Patrick ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FOCUSING; LASER PRODUCED PLASMAS; MAGNETIC LEVITATION; MIRRORS; OPTICAL COATINGS; OPTICAL DESIGN; OPTICAL MULTILAYERS; OPTICAL RESOLVING POWER; PLASMA SOURCES; PRECISION ENGINEERING; SOLID STATE LASERS; ULTRAVIOLET RADIATION;

ENGINEERING TEST STAND (ETS); EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); GRAZING-INCIDENCE MIRRORS; NUMERICAL APERTURE;

PHOTOLITHOGRAPHY;

EID: 0033725373     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (18)