UV NIL template making and imprint evaluation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Sasaki, Shiho ^a   Hiraka, Takaaki ^a   Mizuochi, Jun ^a   Nakanishi, Yuko ^a   Yusa, Satoshi ^a   Morikawa, Yasutaka ^a   Mohri, Hiroshi ^a   Hayashi, Naoya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Eb writing; Photomask; Template; UV NIL

Indexed keywords

ACCELERATION VOLTAGES; EB WRITING; LINE EDGE ROUGHNESS; LINE-AND-SPACE; MAKING PROCESS; RESOLUTION CAPABILITY; RESOLUTION IMPROVEMENT; SPOT BEAMS; TEMPLATE; UV NIL; VARIABLE SHAPED BEAMS;

NANOIMPRINT LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES;

ELECTRON BEAM LITHOGRAPHY;

EID: 67149087386     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.815467     Document Type: Conference Paper

References (5)

1. S. Yusa, T. Hiraka, A. Kobiki, S. Sasaki, K. Itoh, N. Toyama, H. Mohri, N. Hayashi, "Progress of NIL template making", Proceeding of SPIE, Vol.6607, p. 66073H, 2007.
2. T. Hiraka, S. Yusa, A. Fujii, S. Sasaki, K. Itoh, N. Toyama, M. Kurihara, H. Mohri, N. Hayashi, "UV-NIL template for the 22nm node and beyond", Proceeding of SPIE, Vol.6730, p.67305P , 2007.
3. S. Yusa, T. Hiraka, J. Mizuochi, A. Fujii, Y. Sakai, K. Kuriyama, M. Sakaki, S. Sasaki, Y. Morikawa, H. Mohri, N. Hayashi, "Progress of NIL template making", Proceeding of EMLC2008, p.23-34, 2008.
4. A. Fujii, Y. Sakai, J. Mizuochi, T. Hiraka, S. Yusa, K. Kuriyama, M. Sakaki, T. Sutou, S. Sasaki, Y. Morikawa, H. Mohri, N. Hayashi, "UV NIL mask making and imprint evaluation", Proceeding of SPIE, Vol.7028, p.70281W, 2008.
5. S. Sasaki, T. Hiraka, J. Mizuochi, A. Fujii, Y. Sakai, T. Sutou, S. Yusa, K. Kuriyama, M. Sakaki, Y. Morikawa, H. Mohri, and N. Hayashi, "UV NIL template making and imprint evaluation", Proceeding of SPIE, Vol.7122, p. 71223P-1,