Mechanical resistance of fine microstructures related to particle cleaning mechanisms

Proceedings - Electrochemical Society

Volumn 26, Issue , 2003, Pages 153-160

  Tardif, F ^a   Raccurt, O ^a   Barbe J C ^a   De Crecy F ^a   Besson, P ^a   Danel, A ^a  

^a CEA GRENOBLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CHEMICAL VAPOR DEPOSITION; CONTAMINATION; EVAPORATION; FINITE ELEMENT METHOD; MICROSTRUCTURE; POLYSTYRENES; SEMICONDUCTOR MATERIALS; SHOCK WAVES; SILICA; VAN DER WAALS FORCES;

CHOC WAVES; ELECTROSTATIC FORCES; FRAGILE PATTERNS; WET PROCESSES;

CLEANING;

EID: 3042701593     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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