A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

Surface and Coatings Technology

Volumn 257, Issue , 2014, Pages 308-325

  Anders, André ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Bias; Cathodic arcs; Deposition; High power impulse magnetron sputtering; HiPIMS; Review

Indexed keywords

DEPOSITION; FILM PREPARATION; METAL IONS; METALS; PHYSICAL VAPOR DEPOSITION; REVIEWS; TEXTURES;

BIAS; CATHODIC ARC; CATHODIC ARC PLASMA DEPOSITION; DEPOSITION OF FILMS; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HIPIMS; HISTORICAL DEVELOPMENT; SUBSTRATE SURFACE PREPARATION;

MAGNETRON SPUTTERING;

EID: 84908342897     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2014.08.043     Document Type: Article

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