Evolution of the plasma composition of a high power impulse magnetron sputtering system studied with a time-of-flight spectrometer

Journal of Applied Physics

Volumn 105, Issue 9, 2009, Pages

  Oks, Efim ^a   Anders, Andŕ ^b  

^a INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-POWER; ION CHARGE STATE; MAGNETIC FIELD STRENGTHS; MAGNETRON SPUTTERING SYSTEMS; MOLECULAR GAS; MOLECULAR IONS; PLASMA COMPOSITION; QUANTITATIVE INFORMATION; SPUTTER YIELDS; SPUTTERING GAS; TARGET MATERIALS; TIME-OF-FLIGHT SPECTROMETER;

ARGON; CHROMIUM; DC GENERATORS; GRAPHITE; INCLUSIONS; KRYPTON; MAGNETIC FIELDS; MAGNETRONS; NEGATIVE IONS; NEUTRON SPECTROMETERS; NIOBIUM; PLASMAS; SPECTROMETERS; SPECTROMETRY; SPUTTERING; TRANSITION METALS;

TARGETS;

EID: 67249088898     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3125443     Document Type: Article

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