Pressure dependence of the Al ion energy distribution functions during filtered cathodic arc thin film growth in an Ar, O2 ambient

Journal of Physics D: Applied Physics

Volumn 42, Issue 1, 2009, Pages

  Atiser, Adil ^a   Mrz, Stanislav ^a   Schneider, Jochen M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM; ELECTRIC POWER DISTRIBUTION; FILM GROWTH; ION BEAMS; IONS; PHASE STABILITY; PLASMA SOURCES; PLASMA STABILITY; THIN FILM DEVICES; THIN FILMS;

ALUMINA FILMS; AVERAGE CHARGE STATE; CATHODIC ARCS; CHARGE STATE; ION ENERGY DISTRIBUTION FUNCTIONS; ION POPULATIONS; MONOENERGETIC; PLASMA BEAMS; PLASMA PROCESSING; PRESSURE DEPENDENCES; PRESSURE-DISTANCE PRODUCTS; SHIFTED MAXWELLIAN DISTRIBUTIONS; SUBSTRATE BIAS; THERMALIZATION; THIN-FILM GROWTHS; THIN-FILM PROPERTIES;

DISTRIBUTION FUNCTIONS;

EID: 63649104309     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/1/015202     Document Type: Article

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