Evaporation-assisted high-power impulse magnetron sputtering: The deposition of tungsten oxide as a case study

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 4, 2012, Pages

  Hemberg, Axel ^a,b   Dauchot, Jean Pierre ^b   Snyders, Rony ^a,b   Konstantinidis, Stephanos ^b  

^a MATERIA NOVA RESEARCH CENTER   (Belgium)

^b UNIVERSITY OF MONS   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-POWER; LOW MELTING POINT; METALLIC TARGETS; PULSE DURATIONS; REACTIVE ATMOSPHERES; TARGET MATERIALS; TARGET VOLTAGE; TUNGSTEN OXIDE; TUNGSTEN TRIOXIDE; TUNGSTEN TRIOXIDE THIN FILM; WORKING CONDITIONS;

MAGNETRON SPUTTERING; THERMAL EVAPORATION; TUNGSTEN; TUNGSTEN COMPOUNDS;

PHASE TRANSITIONS;

EID: 84863692487     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4722728     Document Type: Article

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