Plasma distribution in a triple-cathode vacuum arc deposition apparatus

Plasma Sources Science and Technology

Volumn 8, Issue 3, 1999, Pages 355-362

  Ben Ami, R ^a   Zhitomirsky, V N ^a   Boxman, R L ^a   Goldsmith, S ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; DEPOSITION; ELECTRIC COILS; ELECTRIC CURRENT DISTRIBUTION; IONS; MAGNETIC FIELDS; NIOBIUM; PARTICLE BEAMS; PLASMA GUNS; PRESSURE EFFECTS; TITANIUM; ZIRCONIUM;

GAUSSIAN FUNCTION; ION CURRENT DISTRIBUTION; PLASMA BEAMS; PLASMA DISTRIBUTION; VACUUM ARC DEPOSITION APPARATUS;

PLASMAS;

EID: 0032635315     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/8/3/303     Document Type: Article

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