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Volumn 67, Issue 3-4, 2002, Pages 673-686

Energetic deposition using filtered cathodic arc plasmas

Author keywords

Adhesion; Atomic scale heating; Energetic deposition; Film stress; Filtered cathodic arc; Metal plasma immersion ion implantation and deposition (MePIIID); Review; Subplantation

Indexed keywords

ADHESION; CATHODES; COMPRESSIVE STRESS; DEPOSITION; ELASTIC MODULI; ELECTRIC ARCS; ION IMPLANTATION; KINETIC ENERGY; PLASMA APPLICATIONS; STRESS ANALYSIS; SURFACE ROUGHNESS;

EID: 0037179737     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00260-9     Document Type: Conference Paper
Times cited : (93)

References (91)
  • 30
    • 0010600919 scopus 로고    scopus 로고
    • In-situ deposition of sacrificial layers during ion implantation: Concept and simulation
    • Williams J.S., Elliman R.G., Ridgway M.C., editors. Amsterdam: Elsevier
    • Anders A., Anders S., Brown I.G., Yu K.M. In-situ deposition of sacrificial layers during ion implantation. concept and simulation Williams J.S., Elliman R.G., Ridgway M.C. Ion beam modification of materials. 1996;1089-1092 Elsevier, Amsterdam.
    • (1996) Ion beam modification of materials , pp. 1089-1092
    • Anders, A.1    Anders, S.2    Brown, I.G.3    Yu, K.M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.