Arc deposition of Ti-Si-C-N thin films from binary and ternary cathodes - Comparing sources of C

Surface and Coatings Technology

Volumn 213, Issue , 2012, Pages 145-154

  Eriksson, A O ^a   Ghafoor, N ^a   Jensen, J ^a   Naslund L A ^a   Johansson, M P ^a,b   Sjolen J ^b   Oden M ^a   Hultman, L ^a   Rosen, J ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b SECO TOOLS AB   (Sweden)

Author keywords

Cathodic arc deposition; Compound cathodes; Hard coatings; Reactive deposition; Ti Si C N

Indexed keywords

ARC DEPOSITION; CATHODIC ARC DEPOSITION; CEMENTED CARBIDE SUBSTRATES; COMPOSITIONAL RANGE; GASPHASE; HIGH HARDNESS; INTERSTITIALS; ION BEAM ANALYSIS; LOW ANGLE GRAIN BOUNDARIES; NANO-METER SCALE; NANOCRYSTALLINES; PLASMA IONS; REACTIVE DEPOSITION; SCANNING AND TRANSMISSION ELECTRON MICROSCOPY; STRUCTURAL EVOLUTION; STRUCTURE AND PROPERTIES; TI-SI-C-N;

ALLOYING ELEMENTS; DEPOSITION; GRAIN BOUNDARIES; HARD COATINGS; SILICON; THIN FILMS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; X RAY DIFFRACTION;

CATHODES;

EID: 84870218882     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2012.10.038     Document Type: Article

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