Heat treatable indium tin oxide films deposited with high power pulse magnetron sputtering

Thin Solid Films

Volumn 517, Issue 10, 2009, Pages 3178-3182

  Horstmann, F ^a   Sittinger, V ^a   Szyszka, B ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

HIPIMS; HPPMS; ITO; Low E

Indexed keywords

ANNEALING; DC GENERATORS; ELECTRIC PROPERTIES; ELECTRODEPOSITION; INDIUM; MAGNETRONS; PHOTOLITHOGRAPHY; POWER CONVERTERS; SILICON ALLOYS; TIN; TITANIUM COMPOUNDS;

ANNEALED FILMS; BEFORE AND AFTER; CERAMIC TARGETS; CHRISTIE; DIRECT CURRENT MAGNETRON SPUTTERING; HIGH-POWER PULSE; HIPIMS; HPPMS; INDIUM TIN OXIDE FILMS; ITO; ITO FILMS; LOW-E; MECHANICAL DURABILITIES; OPTICAL AND ELECTRICAL PROPERTIES; SILICON-OXYNITRIDE; STATE-OF-THE ARTS; SUBSTRATE HEATING; TEST CONDITIONS;

OXIDE FILMS;

EID: 61449093768     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.11.092     Document Type: Article

References (7)

1. Christie D.J., Tomasel F., Sproul W.D., and Carter D.C. J. Vac. Sci. Technol., A 22 (2004) 1415
2. Kouznetsov V., Macak K., Schneider J.M., Helmersson U., and Petrov I. Surf. Coat. Technol. 122 (1999) 290
3. Helmersson U., Lattemann M., Alami J., Bohlmark J., Ehiasarian A.P., and Gudmundsson J.T. Annu. Tech. Conf. Proc. - Soc. Vac. Coaters, Annu. Tech. Conf. 48 (2005) 458
4. Suzuki A., Matsushita T., Aoki T., Mori A., and Okuda M. Thin Solid Films 411 (2002) 23
5. Agura H., Suzuki A., Matsushita T., Aoki T., and Okuda M. Thin Solid Films 445 (2003) 263
6. Sittinger V., Ruske F., Szyszka B., Christie D.J., and Wallendorf T. Thin Solid Films 516 (2008) 5847
7. B. Szyszka, Phd-Thesis, University of Giessen (1999).