Filtered vacuum arc deposition of transparent conducting Al-doped ZnO films

Thin Solid Films

Volumn 515, Issue 3, 2006, Pages 885-890

  Zhitomirsky, V N ^a   Cetinorgu E ^a,b   Adler, E ^a   Rosenberg, Yu ^a   Boxman, R L ^a   Goldsmith, S ^a  

^a TEL AVIV UNIVERSITY   (Israel)

^b CUKUROVA UNIVERSITY   (Turkey)

Author keywords

Crystalline structure; Filtered vacuum arc deposition; Resistivity; ZnO; ZnO:Al

Indexed keywords

ALUMINUM; DEPOSITION; DOPING (ADDITIVES); ELECTRIC PROPERTIES; FILTRATION; OPTICAL PROPERTIES; VACUUM APPLICATIONS; ZINC OXIDE;

AMBIENT AIR CONDITIONS; CATHODE MATERIALS; FILTERED VACUUM ARC DEPOSITION (FVAD); ZNO:AL;

CONDUCTIVE FILMS;

EID: 33750427881     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.150     Document Type: Article

References (30)

1. Özgür Ü., Avilov Ya.A., Liu C., Reshchikov M.A., Doǧan S., Avrutin V., Cho S.-J., and Morkoc H. J. Appl. Phys. 98 (2005) 041301
2. Gläser H.J. Large Area Glass Coating (2000), Von Ardenne Anlagentechnik GMBH, Dresden 175
3. Hartnagel H.L., Dawar A.L., Jain A.K., and Jagadish C. Semiconducting Transparent Thin Films (1995), Institute of Physics Publishing, Bristol
4. Islam M.N., Ghosh T.B., Chopra K.L., and Acharya H.N. Thin Solid Films 280 (1996) 20
5. Lee J.-H., and Park B.-O. Thin Solid Films 426 (2003) 94
6. Tominaga K., Kataoka M., Ueda T., Chong M., Shintani Y., and Mori I. Thin Solid Films 253 (1994) 9
7. Matsunami N., Fukuoka O., Tazawa M., and Sataka M. Surf. Coat. Technol. 196 (2005) 50
8. Kelly P.J., Zhou Y., and Postill A. Thin Solid Films 426 (2003) 111
9. Miyata T., Ida S., and Minami T. J. Vac. Sci. Technol., A, Vac. Surf. Films 21 (2003) 1404
10. Boxman R.L., and Zhitomirsky V.N. Rev. Sci. Instrum. 77 (2006) 021101
11. Ben-Shalom A., Kaplan L., Boxman R.L., Goldsmith S., and Nathan M. Thin Solid Films 236 (1993) 20
12. Kaplan L., Ben-Shalom A., Boxman R.L., Goldsmith S., Rosenberg U., and Nathan M. Thin Solid Films 253 (1994) 1
13. Takikawa H., Kimura K., Miyano R., and Sakakibara T. Thin Solid Films 377-378 (2000) 74
14. Xu X.L., Lau S.P., Chen J.S., Chen G.Y., and Tay B.K. J. Cryst. Growth 223 (2001) 201
15. Xu X.L., Lau S.P., and Tay B.K. Thin Solid Films 398-399 (2001) 244
16. Wang Y.G., Lau S.P., Lee H.W., Yu S.F., and Tay B.K. J. Appl. Phys. 94 (2003) 1597
17. Yu S.F., Yuen C., Lau S.P., Wang Y.G., Lee H.W., and Tay B.K. Appl. Phys. Lett. 83 (2003) 4288
18. Lee H.W., Lau S.P., Wang Y.G., Tay B.K., and Hng H.H. Thin Solid Films 458 (2004) 15
19. Lee H.W., Lau S.P., Wang Y.G., Tse K.Y., Hng H.H., and Tay B.K. J. Cryst. Growth 268 (2004) 596
20. David T., Goldsmith S., and Boxman R.L. Thin Solid Films 447-448 (2004) 61
21. David T., Goldsmith S., and Boxman R.L. J. Phys. D: Appl. Phys. 38 (2005) 2407
22. Kaplan L., Zhitomirsky V.N., Goldsmith S., Boxman R.L., and Rusman I. Surf. Coat. Technol. 76-77 (1995) 181
23. Zhitomirsky V.N., Boxman R.L., and Goldsmith S. J. Vac. Sci. Technol., A, Vac. Surf. Films 13 (1995) 2233
24. ASTM standard D 3359-93. Standard Test Methods for Measuring Adhesion by Tape Test (1994)
25. Zhitomirsky V.N., Kaplan L., Boxman R.L., and Goldsmith S. Surf. Coat. Technol. 76-77 (1995) 190
26. PDF Card No. 36-1451, JCPDS-Int. Center Diffraction Data, Zinc Oxide, 2004.
27. Klug H.P., and Alexander L.E. X-ray Diffraction Procedures: For Polycrystalline and Amorphous Materials. 2nd edition (1974), John Wiley and Sons, NY
28. Pankove J.I. Optical Processes in Semiconductors, Chapter 4 (1971), Prentice-Hall, Englewood Cliffs, N.J.
29. Zhitomirsky V.N., Kinrot U., Alterkop B., Boxman R.L., and Goldsmith S. Surf. Coat. Technol. 86/87 (1996) 263
30. Alterkop B., Zhitomirsky V.N., Goldsmith S., and Boxman R.L. IEEE Trans. Plasma Sci. 24 (1996) 1371