Deposition of superhard amorphous carbon films by pulsed arc sources

IEEE Transactions on Plasma Science

Volumn 25, Issue 4, 1997, Pages 685-688

  Scheibe, Hans Joachim ^a   Schultrich, Bernd ^a   Ziegele, Holger ^a   Siemroth, Peter ^a  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBON; CRYSTALLINE MATERIALS; ELECTRIC ARCS; PLASMA SOURCES; SPUTTER DEPOSITION;

PULSED ARC DEPOSITION; SUPERHARD AMORPHOUS CARBON FILMS;

PLASMA APPLICATIONS;

EID: 0031208054     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.640686     Document Type: Article

References (10)

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