HiPIMS deposition of TiOx in an industrial-scale apparatus: Effects of target size and deposition geometry on hysteresis

Surface and Coatings Technology

Volumn 235, Issue , 2013, Pages 714-719

  Surpi, Alessandro ^a   Kubart, Tomas ^b   Giordani, Diego ^c   Tosello, Martino ^c   Mattei, Giovanni ^c   Colasuonno, Marino ^a   Patelli, Alessandro ^a  

^a Veneto Nanotech SCpA Via San Crispino ^*  (Italy)

^b UPPSALA UNIVERSITY   (Sweden)

^c UNIVERSITY OF PADOVA   (Italy)

Author keywords

High power impulse magnetron sputtering; Hysteresis; Industrial scale deposition apparatus; Reactive sputtering; Titanium oxide

Indexed keywords

DEPOSITED COATINGS; DEPOSITION CHAMBERS; DEPOSITION GEOMETRY; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); INDUSTRIAL-SCALE; PHASE CONSTITUTION; PULSING FREQUENCIES; TITANIUM DIOXIDE THIN FILM;

COATINGS; HYSTERESIS; INDUSTRY; MAGNETRON SPUTTERING; OXIDE MINERALS; REACTIVE SPUTTERING; TITANIUM; TITANIUM OXIDES; X RAY DIFFRACTION;

DEPOSITION;

EID: 84886297830     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.08.053     Document Type: Article

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