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Journal of Applied Physics

Volumn 109, Issue 7, 2011, Pages

Energetic deposition of carbon in a cathodic vacuum arc with a biased mesh

(6) Moafi, A a Lau, D W M a Sadek, A Z a Partridge, J G b McKenzie, D R c McCulloch, D G a

a RMIT UNIVERSITY (Australia)

b UNIVERSITY OF CANTERBURY (New Zealand)

c UNIVERSITY OF SYDNEY (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS POTENTIAL; CATHODIC VACUUM ARCS; DEPOSITION ENERGY; FILM PROPERTIES; FILM STRESS; FILTERED CATHODIC VACUUM ARC; FLOATING POTENTIALS; LOW CONDUCTIVITY; MICROSTRUCTURAL PROPERTIES; MONOTONIC DECREASE; PLASMA STREAMS; POTENTIAL APPLICATIONS; SUBSTRATE BIAS;

AMORPHOUS FILMS; CONDUCTIVE FILMS; DISTILLATION; OHMIC CONTACTS; SUBSTRATES; VACUUM; VACUUM APPLICATIONS;

CARBON FILMS;

EID: 79955462620 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3562165 Document Type: Conference Paper

Times cited : (10)

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