Synthesis and in-situ ellipsometric monitoring of Ti/C nanostructured multilayers using a high-current, dual source pulsed cathodic arc

Thin Solid Films

Volumn 482, Issue 1-2, 2005, Pages 133-137

  Ryves, L ^a   Bilek, M M M ^a   Oates, T W H ^b   Tarrant, R N ^a   McKenzie, D R ^a   Burgmann, F A ^c   McCulloch, D G ^c  

^a UNIVERSITY OF SYDNEY   (Australia)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^c RMIT UNIVERSITY   (Australia)

Author keywords

Carbon; Ellipsometry; Multilayers; Titanium

Indexed keywords

CARBON; DEPOSITION; ELLIPSOMETRY; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MULTILAYERS; NANOSTRUCTURED MATERIALS; SYNTHESIS (CHEMICAL); THICKNESS CONTROL; TRANSMISSION ELECTRON MICROSCOPY;

DEPOSITION RATES; FILM THICKNESS; NANOMETERS; PULSED CATHODIC ARC SYSTEMS;

TITANIUM;

EID: 17644382272     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.163     Document Type: Conference Paper

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