The properties of TiN ultra-thin films grown on SiO2 substrate by reactive high power impulse magnetron sputtering under various growth angles

Thin Solid Films

Volumn 548, Issue , 2013, Pages 354-357

  Shayestehaminzadeh, S ^a   Tryggvason, T K ^a   Karlsson, L ^b   Olafsson, S ^a   Gudmundsson, J T ^a,c  

^a UNIVERSITY OF ICELAND   (Iceland)

^b JACOBS UNIVERSITY BREMEN   (Germany)

^c SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Angular deposition; High power impulse magnetron sputtering; Thin film; Titanium nitride

Indexed keywords

ANGLE DEPENDENCE; CONVENTIONAL DC MAGNETRON SPUTTERING; DIFFRACTION AND REFLECTION; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); ON-AXIS GROWTHS; POLYCRYSTALLINE; STRUCTURAL CHARACTERIZATION; SUBSTRATE SURFACE;

DEPOSITION; GRAIN SIZE AND SHAPE; GROWTH RATE; MAGNETRON SPUTTERING; SURFACE ROUGHNESS; THIN FILMS; TITANIUM NITRIDE; ULTRATHIN FILMS; X RAY DIFFRACTION;

AMORPHOUS FILMS;

EID: 84887460969     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2013.09.025     Document Type: Article

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