Microstructural evolution during film growth

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 5, 2003, Pages

  Petrov, I ^a   Barna, P B ^b   Hultman, L ^c   Greene, J E ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^c LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; FILM GROWTH; MATERIALS SCIENCE; POLYCRYSTALLINE MATERIALS; TEXTURES; AMORPHOUS MATERIALS; COMPUTER SIMULATION; CRYSTALLIZATION; MONTE CARLO METHODS; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY;

INTERCOLUMNAR VOIDS; GRAIN BOUNDARY MIGRATION; GRAIN COARSENING; LOW-ENERGY ION IRRADIATION; POLYCRYSTALLLINE THIN FILMS; SCANNING PROBE MICROSCOPY; SELECTED AREA ELECTRON DIFFRACTION; STRUCTURE ZONE MODELS;

THIN FILMS;

EID: 0142087594     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1601610     Document Type: Conference Paper

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