메뉴 건너뛰기




Volumn 47, Issue 3, 1996, Pages 307-311

Low pressure magnetron sputtering and selfsputtering discharges

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; ELECTRIC VARIABLES MEASUREMENT; MAGNETRON SPUTTERING; MAGNETRONS; PRESSURE MEASUREMENT; TARGETS; VACUUM APPLICATIONS; VACUUM PUMPS;

EID: 0030108633     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0042-207X(96)80013-3     Document Type: Article
Times cited : (42)

References (25)
  • 18
    • 85029982896 scopus 로고    scopus 로고
    • Czech Republic Patent Application No. PV 1542-93 (1993)
    • S Kadlec, J Musil and A Rajský, Czech Republic Patent Application No. PV 1542-93 (1993).
    • Kadlec, S.1    Musil, J.2    Rajský, A.3
  • 19
    • 85029979722 scopus 로고    scopus 로고
    • Czech Republic Patent Application No. PV 1820-93 (1993)
    • S Kadlec and J Musil, Czech Republic Patent Application No. PV 1820-93 (1993).
    • Kadlec, S.1    Musil, J.2
  • 21
    • 85029980792 scopus 로고    scopus 로고
    • private communication
    • W M Posadowski (private communication).
    • Posadowski, W.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.