Managing arcs in large area sputtering applications

Thin Solid Films

Volumn 520, Issue 12, 2012, Pages 4199-4202

  Carter, D ^a   Walde, H ^a   Nauman, K ^a  

^a Advanced Energy Industries Incorporated   (United States)

Author keywords

Arc energy; Arc rate; Arc suppression; Magnetron sputtering

Indexed keywords

ARC BEHAVIOR; ARC DETECTION; ARC ENERGY; ARC RATE; ARC SUPPRESSION; KEY FACTORS; POWER SUPPLY; PROCESS IMPACT;

MAGNETRON SPUTTERING; OPTIMIZATION; THIN FILMS;

VAPOR DEPOSITION;

EID: 84858706248     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.103     Document Type: Conference Paper

References (9)

1. A. Anders Thin Solid Films 502 2006 22
2. V. Pavate, M. Abburi, S. Chiang, K. Hansen, G. Mori, M. Narasimhan, S. Ramaswami, and J. Nulman SPIE Proc. 3214 1997 42
3. C.E. Wickersham Jr., J.E. Poole, A. Leybovich, and L. Zhu J. Vac. Sci. Technol. A 19 2001 2767
4. C.E. Wickersham Jr., J.E. Poole, and J.S. Fan J. Vac. Sci. Technol. A 20 2002 833
5. C.E. Wickersham Jr., J.E. Poole, J.S. Fan, and L. Zhu J. Vac. Sci. Technol. A 19 2001 2741
6. Belkind, A. Freilich, and R. Scholl Society of Vacuum Coaters Conference Proceedings 41 1998 321
7. R.A. Scholl Society of Vacuum Coaters Conference Proceedings 37 1994 312
8. F. Milde, D. Schulze, G. Teschner, P. Wiedemuth, and T. Rettich Society of Vacuum Coaters Conference Proceedings 44 2001 375
9. D. Carter, and H. Walde Society of Vacuum Coaters Conference Proceedings 53 2010 256