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Journal of Applied Physics

Volumn 113, Issue 13, 2013, Pages

Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides

(5) Aiempanakit, Montri a Aijaz, Asim a Lundin, Daniel a,b Helmersson, Ulf a Kubart, Tomáš c

a LINKÖPING UNIVERSITY (Sweden)

b ROYAL INSTITUTE OF TECHNOLOGY (Sweden)

c UPPSALA UNIVERSITY (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

DIRECT CURRENT MAGNETRON SPUTTERING; DISCHARGE BEHAVIORS; DISCHARGE CURRENTS; ENERGY DISTRIBUTIONS; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); IONIC CONTRIBUTION; TIME EVOLUTIONS; TIME-RESOLVED MASS SPECTROMETRY;

ALUMINUM; IONIZATION; MASS SPECTROMETRY; OXYGEN;

MAGNETRON SPUTTERING;

EID: 84880692869 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.4799199 Document Type: Conference Paper

Times cited : (91)

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